Definitions for "LPCVD"
Low Pressure CVD: deposits a layer of polysilicon to the wafer, later removed by polishing. A backside layer can act as a gettering agent.
Low Pressure CVD refers to systems that process wafers in an environment with less than atmospheric pressure. LPCVD systems may be furnaces that process wafers in batches, or single-wafer systems.
see Low Pressure Chemical Vapor Deposition