Selective masking generates light patterns that direct chemical transformations to specific areas of photosensitive surfaces. Photolithography usually requires expensive equipment and particular knowledge; the technology is protected by patents
A form of lithography in which light-sensitive plates or stones are exposed to a photographic image, usually by means of a halftone screen.
The process of making a processor by having light etch the transistors into a base material. A photomask is used to block the light where it isn't suppose to go. The light that hits the material will react with the materials light sensitive coating creating a hardened coating. The material is then exposed to an acid which will etch the base material which was not reacted with the light.
In MEMS fabrication, the process used to transfer an image to a semiconductor wafer or other substrate. Typical steps include photoresist coating, exposure, photoresist development, and baking.
a planographic printing process using plates made from a photographic image
The patterning step of the process by which transistors are made for displays or microprocessors. Thin films of silicon or other materials are deposited on a substrate then covered with another material (photoresist) that reacts to light. This material is exposed to light through a mask that is patterned for one layer of the transistor. Then the exposed area is etched away, taking the underlying thin film with it. Then the photoresist is cleaned off, leaving the patterned thin film. This is repeated several times with different thin films to create the transistor array.
The photographic process used to transfer circuit patterns onto a semiconductor wafer. This is done by projecting light through a patterned reticle, onto a silicon wafer covered with a photosensitive material (photoresist). A reticle is a glass plate with a layer of chrome on one side.
is the process by which a circuit pattern is transferred to a wafer.
The process of projecting a photomask pattern or image with UV light onto a wafer coated with photosensitive emulsion.
A process that uses light to create a lithographic image on a substrate.
use of optically-exposed photoresist masks to produce patterns
The process used to manufacture probe arrays in conjunction with combinatorial chemistry through a series of cycles. Using light, photolabile protection groups are removed from linkers bound to the glass substrate (wafer) to enable nucleotide phosphoramidite addition in specific deprotected locations. Each light exposure and subsequent phosphoramidite addition is equal to one cycle. Typically, probe arrays are synthesized in about 80 cycles.
Photolithography is a method of lithographic reproduction in which exposure is used to put patterns on materials. It is very important in printing technology and in semiconductor technology.
A type of lithographic process used in the manufacturing of semiconductor devices, integrated circuits, and photomasks. It comprises applying a layer of material known as photoresist or simply resist, exposing the resist to UV light, developing the exposed resist (see photoresist for detail)
the process of producing by photography designs upon a lithographic stone from which prints may be taken.
A process by which a mask pattern is transferred to a wafer, usually using a "stepper."
lithography where the pattern is defined by a photographic process.
Photography is the best analogy to describe the photolithography process. The stepper is like a photographic enlarger where a light source projects an image through a lens system onto photographic paper. The machine used to do all of this is called a "stepper" because it literally does one die or a few die at a time, then steps to the next die or set of die until it has exposed the entire wafer.
Carving through the use of light. Typically, a photosensitive surface (a photoresist) is selectively exposed to light using a template. The exposed areas are subsequently etched (chemically carved).
The process of reproducing the chip's circuitry pattern onto the wafer surface by using ultraviolet light and stencils or masks to transfer the image photomechanically.
A method of printing in which the original subject is photographed and the consequent image is transferred to a (metal) plate for lithographic printing. Loosely used for the whole process of lithography, and vice versa.
Lithographic printing whereby the image is transferred to the plate photographically and printed on an offset lithographic press.
lithographic printing process using an image formed by photographic means.
The "etching with light" technique used to make integrated circuits. In this technique, a layer of silicon or other semiconductor is covered by a protective oxide layer which in turn is covered by a polymer that reacts to light. A mask outlining desired circuits is laid on top, then the masked polymer is exposed to light. The light chemically changes the exposed areas of the polymer. Chemicals are then applied to wash away the exposed polymer and the oxide underneath. The remaining polymer is washed away with other chemicals, leaving the layer of oxide in the form of the mask and the layer of silicon exposed in the pattern of the desired circuits. The exposed silicon is then "doped," or chemically altered, to become more electrically conductive. This forms the transistors and logic gates of the chip.
This article discusses the modern manufacture of semiconductors. For earlier uses of photolithography in printing, please see lithography.