(1)A process in which structures on an integrated circuit's substrate are eroded by the flow of electrons in much the same way as land is eroded by a river (also known as subatomic erosion). (2)The process of forming transistor-like regions in a semiconductor using an intense magnetic field.
an effect plaguing some metals in particular aluminum; physical motion of atoms out of the areas where current density is very high; caused primarily by frictional force between metal ions and flowing electrons; results in the break in the metal line; common cause of malfunction of aluminum interconnect network in integrated circuits; main reason for which Al interconnects are being replaced with copper interconnects in advance IC technology.
The mass transport of metal ions in aluminum metal lines, potentially thinning and thus inhibiting conduction paths. This occurs when ions are pulled from their lattice sites through electron collisions and thermal exitation.