Can be described as a photo negative. The image on the negative is written with Micronic's pattern generator. In the production of the end product, e.g. IC or FPD, the image on the photomask is trans- ferred to the substrate via a photographic process. There are two types of microlithographic photomasks: photo emulsion on glass and chrome on glass. The photosensitive material on the chrome photomask is a layer of photoresist covering the chrome layer. Photoresist is a light sensitive material with properties such that it can be washed away after exposure.
Photolithographical mask. Photomasks are used for the structuring of semiconductor wafers for the fabrication of ICs. In principle the masks are thin glass carriers on which the structures of the different levels of an integrated circuit are exactly mapped. A complete set of photomasks contains all information for the fabrication of an integrated circuit with a specific semiconductor technology. See also: Wafer
a kind of template that's used to optically transfer images of integrated circuits onto the surface of silicon wafers, and it is a crucial element in the manufacture of large-scale integrated circuits (LSI's) and integrated circuits (ICs)